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標題: 應用電腦視覺於CMOS-MEMS微結構後製程檢測
Post-Process Inspection of CMOS-MEMS Microstructures Using Computer Vision Technique
作者: 李國弘
Lee, Kuo-Hung
關鍵字: computer vision;電腦視覺;CMOS-MEMS;post-process;inspection;CMOS-MEMS;後製程;檢測
出版社: 機械工程學系所
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CMOS-MEMS technique uses the commercial CMOS (complementary metal oxide semiconductor) process to fabricate MEMS (micro-electro- mechanical system) devices. Most of CMOS-MEMS devices need the post-process to etch the sacrificial layers, and to release the suspended structures. The post-process is the key technique for the fabrication of CMOS-MEMS devices. Using the computer vision inspection, the feature dimensions and defects of micro devices can be inspected before the verification of electrical properties.
In this study, an inspection process for the post-process is developed. The inspection process uses the computer vision technique to monitor the etching variation of microstructures during the post-process, and to measure the etched dimensions of the microstructure. The computer vision technique employs an optical microscopy and a measurement program edited by C++ software to detect the microstructure features, dimensions (included linear width, linear distance, area of structure, center of circle and radius) and changes in the post-process. The etch rate of the microstructure can be found by monitoring the dimension changes in etching.
其他識別: U0005-1201200909591800
Appears in Collections:機械工程學系所

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