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標題: 近接式微影製程之光學繞射與光阻吸附效應研究
An Investigation on the Diffraction and Absorption Effects of Proximity Lithography
作者: 范志威
Fan, Jhy-Wei
關鍵字: Proximity Lithography;近接式微影製程;Diffraction Effects;Absorption Effects;繞射效應;吸附效應
出版社: 機械工程學系所
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Proximity lithography is one of the commonly employed processes for fabricating optics components and micro electromechanical system. However, patterns exposed on the photoresist often distored in the process due to optical diffraction and absorption effects of photoresist. It is an urge issue to investigate the effect. This study, based on the Dill''s model, investigates the effects of absorption of photoresist as well as near-field diffraction on the proximity lithography process. Experiments are also conducted to compare the developed model.
The results showed that the intensity, but not the distribution, is affected by the exposure time. Chemical concentration on the photoresist changed in accordance to the exposure time. This concentration then affects the profile of exposed photoresist. The major contribution of this study is to analyze the combined effect of near-field diffraction and chemical concentration on the photoresist, which dominates the profile in the developing process, in the proximity lithography process.
其他識別: U0005-3008201003104200
Appears in Collections:機械工程學系所

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