Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/2611
標題: 調控型相位還原及顯微光學量測之研究
作者: 林智文
關鍵字: 相位還原;phase unwrapping;電子斑點干涉術;ESPI
出版社: 機械工程學系
摘要: 
本論文以電子斑點干涉術結合顯微技術對尺寸等級不同的待測物進行測量,並結合顯微鏡針對半導體製程所生產出來的微結構量測其變形,而由量化的結果證明顯微電子斑點干涉確實可行且有可能得到一精密的量測結果,另外在此論文中對於相位重建提出創新的想法並融入原有的平行性相位展開法,而由結果可證明加入這個想法後確實可使其更加強健。

We use EPSI to measure samples with different dimensions and the deformation of microstructure, which is manufactured by semiconductor fabrication or Micro Electronic Mechanical system (MEMS) technique, as it combine with microscope. From the results, we can see that this technique is possible to put accurate measurement into practice. In addition, we propose new ideas about phase unwrap and integrate it with innovative phase unwrapping algorithm (reference[6]). The performance becomes better if using the new ideas from the results of testing.
URI: http://hdl.handle.net/11455/2611
Appears in Collections:機械工程學系所

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