Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/2972
標題: Fabricate of AZO transparent conductive film for thin film solar cell application
應用於薄膜太陽電池之氧化鋅摻鋁透明導電膜之研製
作者: 曾志忠
Tseng, Chih-Chung
關鍵字: sputtering;濺鍍;AZO;H plasma;solar cell;氧化鋅餐摻鋁;氫電漿;太陽電池
出版社: 光電工程研究所
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摘要: 
In this experiment, we used RF sputtering system to deposited AZO thin films on Corning 1737 glass and PET plastic substrate. We investigated the better properties for the thin films with different RF power (50-150 W) and substrate temperature (RT-200 ℃). In order to increase the efficiency of solar cell, diluted HCl wet etching can trap incident light in the solar cell, and then, hydrogen plasma treatment can improve the resistivity of AZO thin films, which increase the short circuit current and transfer efficiency.
AZO thin films will be bombarded acutely with too highly RF power, and cause the quality of thin films decreased. Particularly in PET substrate, it caused the substrate distortion obviously. Therefore, we set 100 W as the fixed RF power. The (002) diffraction angle of XRD analysis shift to higher degree because the crystal arranged regularly when the substrate temperature was higher than room temperature, and then decrease the internal stress of the thin films. The best electrical at as-deposition is 1.23×10-3 Ω-cm. The average transmittance exceeded 85% without substrate type in the visible light even the thickness of thin films was 900 nm.
After 30 second of 0.2% diluted HCl wet etching, the resistivity of AZO thin films didn't changed obviously. The main differences were the thickness and surface morphology of the thin films. However, after hydrogen plasma treatment can let resistivity reach to 8.14×10-4 Ω-cm. In the optical properties, optical band gap had blue shift phenomenon because increase the carrier concentration. And then, increase absorption at intrinsic layer in the solar cell because more low-wavelength incident light through AZO thin films.
Finally, we used treated AZO thin films compared the differences with ITO glass which etching by 0.5% diluted HCl 10 seconds and Asahi FTO glass. Subsequently, grew p-i-n silicon thin films on the TCO respectively. It can seen that AZO thin films after diluted HCl and hydrogen plasma treated have more 20% short circuit and 15% transport efficiency than only treated by diluted HCl.
URI: http://hdl.handle.net/11455/2972
其他識別: U0005-0508201012124900
Appears in Collections:光電工程研究所

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