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|標題:||Fabricate of AZO transparent conductive film for thin film solar cell application
|關鍵字:||sputtering;濺鍍;AZO;H plasma;solar cell;氧化鋅餐摻鋁;氫電漿;太陽電池||出版社:||光電工程研究所||引用:|| T. Söderström, F. J. Haug, X. Niquille, V. Terrazzoni, C. Ballif, “Asymmetric intermediate reflector for tandem micromorph thin film silicon solar cells” APPLIED PHYSICS LETTERS 94, 063501 (2009).  S. Fay, U. Kroll, C. Bucher, E. Vallat-Sauvain, A. Shah, “Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes” Solar Energy Materials & Solar Cells 86 (2005) 385-397.  J. Hüpkes, B. Recha, O. Kluth, T. Repmann, B. Zwaygardt, J. Muller, R. Drese, M. Wuttig, “Surface textured MF-sputtered ZnO films for microcrystalline silicon-based thin-film solar cells” Solar Energy Materials & Solar Cells 90 (2006) 3054-3060.  C. J. Kim, D. Kang, I. Song, Jae C. Park, H. Lim, S. Kim, E. Lee, R. Chung, J. C. Lee, Y. Park,”Highly Stable Ga2O3-In2O3-ZnO TFT for Active-Matrix Organic Light-Emitting Diode Display Application”, Electron Devices Meeting, 2006. 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In this experiment, we used RF sputtering system to deposited AZO thin films on Corning 1737 glass and PET plastic substrate. We investigated the better properties for the thin films with different RF power (50-150 W) and substrate temperature (RT-200 ℃). In order to increase the efficiency of solar cell, diluted HCl wet etching can trap incident light in the solar cell, and then, hydrogen plasma treatment can improve the resistivity of AZO thin films, which increase the short circuit current and transfer efficiency.
AZO thin films will be bombarded acutely with too highly RF power, and cause the quality of thin films decreased. Particularly in PET substrate, it caused the substrate distortion obviously. Therefore, we set 100 W as the fixed RF power. The (002) diffraction angle of XRD analysis shift to higher degree because the crystal arranged regularly when the substrate temperature was higher than room temperature, and then decrease the internal stress of the thin films. The best electrical at as-deposition is 1.23×10-3 Ω-cm. The average transmittance exceeded 85% without substrate type in the visible light even the thickness of thin films was 900 nm.
After 30 second of 0.2% diluted HCl wet etching, the resistivity of AZO thin films didn't changed obviously. The main differences were the thickness and surface morphology of the thin films. However, after hydrogen plasma treatment can let resistivity reach to 8.14×10-4 Ω-cm. In the optical properties, optical band gap had blue shift phenomenon because increase the carrier concentration. And then, increase absorption at intrinsic layer in the solar cell because more low-wavelength incident light through AZO thin films.
Finally, we used treated AZO thin films compared the differences with ITO glass which etching by 0.5% diluted HCl 10 seconds and Asahi FTO glass. Subsequently, grew p-i-n silicon thin films on the TCO respectively. It can seen that AZO thin films after diluted HCl and hydrogen plasma treated have more 20% short circuit and 15% transport efficiency than only treated by diluted HCl.
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