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標題: 水性彩色化負型光阻之反應動力學研究
The study on the kinetics of color waterborne photo-resist
作者: 李嘉慶
Lee, Chia-Ching
關鍵字: waterborne photo-resist;水性光阻;kinetics;photo curing;動力學;光聚合反應
出版社: 化學工程學系所
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起始劑Irgacure 651,及多元醇交聯劑poly-thiol混均後,掺入含藍





The photo-resist for color filter in liquid crystal display
(LCD) was generally diluted by the solvents that has
volatility and toxicity problems causing the industrial
pollution. Therefore, many countries are starting to
legislate against the environmental impact induced by
organic solvent; and it's an important fruition to reduce
organic solvent in photo-resist by water but no affect the
efficiency of photo-resist.

The aim of this research is to prepare color waterborne
photo-resist containing multi-acid epoxy acrylate, reactive
diluents monomer, photo-initiator, organic pigment paste,
and polythiol to study the reactivity of photo-
polymerization of color waterborne resist through the
analysis of DPC

The auto-catalytic reaction model was then employed to
establish the kinetics of color waterborne negative-work
photo-resist as functions of organic particle size and
content as well as the amounts of triethylamine, polythiol,
and photo-initiator for the relationship of the photo-
lithographic process with the rate constant and reaction

In conclusion, the key results in this work can be
addressed as follows:
(1)The addition of excessive triethylamine would
reduce the photo-reactivity of color waterborne photo-
(2)increasing the rate constant of photo-polymerization can
reduce the film loss of color waterborne resist during
(3)The addition of poly-thiol would overcome the screen
effect caused by pigment, and increase the
photo-reactivity of color waterborne photo-resists.

Based on the above results, the ideal of green process on
flat plate display industry would be realized.
其他識別: U0005-1402200711462100
Appears in Collections:化學工程學系所

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