Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/4017
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dc.contributor.advisor楊錫杭zh_TW
dc.contributor.author鄭慧成zh_TW
dc.contributor.authorH.C.Chengen_US
dc.date2004zh_TW
dc.date.accessioned2014-06-06T06:26:50Z-
dc.date.available2014-06-06T06:26:50Z-
dc.identifier.urihttp://hdl.handle.net/11455/4017-
dc.description.abstract本論文研究重點乃以真空吸取之創新技術,結合應用於LIGA製程,製作簡單而便宜的之高品質的微透鏡陣列。本製程以SU-8 100之負型光阻,透過光學微影製作出微圓錐陣列結構,再加以電鑄複製出微模仁,並採用JSR THB-120N負型光阻結合微圓錐陣列模仁,以真空方式吸取出微陣列透鏡。製程實驗之關鍵參數為曝光能量及真空壓力控制,其曝光能量之控制採過曝一倍,得以成功製作出錐狀結構;而50μm所吸取製作之微透鏡最佳真空壓力為 -50cmHg,100μm所吸取製作之微透鏡最佳真空壓力為 -60cmHg。且經檢驗結果印証所製作而成之微透鏡陣列表面平整光滑,光學品質良好。zh_TW
dc.description.abstractThe fabrication of microlens array using vacuum suction process combing LIGA-like process is presented in this thesis. Circular pattern array was designed on a photomask and transferred to a substrate through photoresist patterning. The electroforming technology was used to convert the photoresist patterns into metallic molds with an array of nozzles. Molten SU-8 was poured onto the metallic mold and sucked through the nozzle in a vacuum condition. The exposure energy and vacuum pressure were key parameters to manufacture microlens array. Microlens array with 50μm diameter at -50 cm-Hg vacuum pressure and 100μm diameter at -60 cm-Hg vacuum pressure were. After the measured result, Microlens array has smooth surface and excellent optical properties.en_US
dc.description.tableofcontents第一章、緒論 1 1.1 前言 1 1.2 研究目的與動機 3 1.3 微透鏡之應用 4 1.4 論文架構 5 第二章、文獻回顧 6 2.1 表面張力自然回流法 8 2.1.1 光阻熱熔式(Reflow of Photoresist) 8 2.1.2基材膨脹縮收法 10 2.1.3 模具法壓製法 12 2.1.4 PMMA 體積膨脹法 12 2.1.5 滴製法 14 2.2 灰階光罩式(Gray-level Mask) 15 2.3 漸變折射率透鏡 16 2.3.1 平面狀漸變折射率透鏡 17 2.3.2 圓柱狀漸變折射率透鏡 18 2.4 光纖熔融 19 2.5 雙層結構回流 20 2.6 階梯光刻熱熔法(Step heat-forming photoresist method) 21 2.7 雷射直寫、熱熔式 24 2.8 等向性蝕刻(Isotropic Etching)加熱壓 27 2.9 新製程之概述 27 第三章、基本理論 29 3.1 真空吸取成形方法 29 3.1.1微模仁原理 29 3.1.2真空吸取成形理論原理 29 3.2 製程原理 31 3.2.1 鍍金(Metalized film) 31 3.2.2黃光微影 (Photo Lithography) 32 3.2.3電鑄(Electroforming) 38 3.2.4去光阻(Resist Stripping) 41 3.2.5真空吸取成型(Suction) 42 3-3實驗設備 43 3.3.1 加工設備 43 3.3.2 檢驗設備 50 第四章、微透鏡陣列之設計、製造 51 4.1 前言 51 4.2設計步驟 51 4.2.1 光微影製程光阻之採用 51 4.2.2 光阻厚度及鎳鈷合金微模仁 54 4.2.3 微透鏡陣列之製程流程圖 55 第五章、微透鏡陣列製程 56 5.1 鍍導電層(Metalized film) 58 5.2 曝光微影(Photo lithography) 58 5.4 去光阻(Resist Stripping) 67 5.4 真空吸取(Suction) 69 5.4.1 基材選擇 69 5.4.2 光阻旋塗 69 5.4.3 真空吸取 70 第六章、實驗結果之分析與討論 71 6.1 實驗量測檢驗設備 71 6.1.1.光學顯微鏡(Microscope)及其量測原理 71 6.1.2.掃描式電子顯微鏡(SEM) 73 6.1.3 3-D輪廓粗度儀 76 6.2 實驗結果 79 6.2.1 曝光能量之選擇 79 6.2.2 真空壓力之控制 83 6.3 實驗誤差探討 100 第七章 結論與未來展望 101 7.1 結論 101 7.2 未來展望 102 參考文獻 103zh_TW
dc.language.isoen_USzh_TW
dc.publisher精密工程研究所zh_TW
dc.subjectmicro lens arrayen_US
dc.subject微透鏡陣列zh_TW
dc.subjectvacuum suctionen_US
dc.subjectelectroformingen_US
dc.subjectmoldingen_US
dc.subject真空吸取式zh_TW
dc.subject微電鑄zh_TW
dc.subject成形模具zh_TW
dc.title真空吸取應用於類LIGA技術成型微透鏡陣列之製程探討zh_TW
dc.titleSTUDY OF VACUUM SUCTION IN LIGA-LIKE TECHNOLOGY FOR MICROLENS ARRAY FABRICATION.en_US
dc.typeThesis and Dissertationzh_TW
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.languageiso639-1en_US-
item.grantfulltextnone-
item.cerifentitytypePublications-
item.openairetypeThesis and Dissertation-
item.fulltextno fulltext-
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