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標題: 聚焦型傾斜微透鏡陣列製程研究
Fabrication Study of Focusing Asymmetric Microlens Array
作者: 劉懿仁
Liu, Yi-Jen
關鍵字: asymmetric microlens array;非對稱微型透鏡陣列;off-axis photoresist structure;offset-alignment technique;curve-fitting;focusable area;疊加製程;偏移對位;球形曲線耦合;聚焦區域
出版社: 精密工程學系所
引用: [1] T. H. Lin, H. Yang and C. K. Chao, “Concave microlens array mold fabrication in photoresist using UV proximity printing,” Microsystem Technologies, 13, pp.1537-1543, 2007. [2]S. Y. Hung, C. P. Lin, H. Yang, and Y. P. Chang "Optimal design using thermal reflow and caulking for fabrication of gapless microlens array mold inserts," Optical Engineering, 46(4), 043402-1~8, 2007. [3] T. H. Lin, S. Y. Hung, H. Yang and C. K. Chao, “Fabrication of a microlens array electroformed mold with low roughness and high hardness,” Journal of Micromechanics and Microengineering, 17, 419-425, 2007. [4] H. Yang, R. F. Shyu, J. W. Huang, “New production method of convex microlens arrays for integrated fluorescence microfluidic detection systems,” Microsystem Technologies, vol. 12, pp. 907-912, 2006. [5] J. Gan, L. Wu, H. Luan, B. Bihari, and R. T. Chen,“ Two-imensionalsurface-normal microcoupler array for guide-wave optical clock distribution,” IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 11, no.11, pp.1452-1454, 1999. [6] I. Mikulskas,“ Fabrication of photonic structures by means of interference lithography and reactive ion etching,” Applied Surface Science, Vol. 186, pp.599-603, 2002. [7] F. Ko, J. Chen, F. Chang,“ Fabricating and characterizing oblique polymer structures by electron beam writing on resist-coated SiO2 wafers," Microelectronic Engineering, Vol. 83, pp. 1132-1137, 2006. [8]吳昭雄,“浸入式傾斜曝光製作複合光學微結構之研究”,碩士論文,2007. [9] C. C. A. Chen, C. M. Chen, J. R. Chen,“ Tool path generation for diamond shaping of aspheric lens array,” Journal of Materials Processing Technology, vol. 192-193, pp. 194-199, 2007.   [10] S. S. Hsu, H. Yang,“ High Fill-factor Microlens Array Fabrication Using Proximity Printing with the Microlens Array Mask,” International Symposium on Robotics and Intelligent Sensors, March, 2010. [11] J. J. Yang,“ The Study of LIGA Like Fabrication Process for Refractive/Diffractive Microlens”, 畢業論文, 2007. [12] J. J. Yang, Y. S. Liao and C. F. Chen, “Fabrication of long hexagonal micro-lens array by applying gray-scale lithography in micro-replication process,” Optics Communications 270, p.p. 433–440, 2007. [13] A. Schilling, R. Merz, C. Ossmann and H. P. Herzing, “Surface Profiles of Reflow Microlenses under the Influence of Surface Tension and Gravity”, Optical Engineering, Vol. 39, No. 8, pp. 2171-2176, 2000. [14] S. A. Campbell, “The science and engineering of microelectronic fabrication”, p.p. 195-196, 2001. [15] 許泳順,“表面張力及重力對光阻熱熔成型形貌影響之探討” ,畢業論文,民國九十五年 [16] E. Hecht, Optics Fourth Edition, Addison Wesley, pp.95-100, 2002. [17] 鍾明昌,“以熱整形方法形成微透鏡陣列之機制探討與應用”,碩士論文,2004. [18] Activities of Exhibition and Education in Astronomy,AEEA天文教育資訊網, [19] 薩本棟,普通物理學,第 876~882 頁,中華教育文化基金董事會編輯委員會,台灣商務印書館,民國四十九年 [20] 李冠卿,近代光學,第 18-20 頁,聯經出版事業公司,民國七十七年 [21] 耿繼業,何建娃,幾何光學,全華科技圖書股份有限公司,民國九十三年 [22] B. Shapiro, H. Moon, R. L. Garrell and C. J. Kim, “ Equilibrium Behavior of Sessile Drops under Surface Tension, Applied External Fields, and Material Variations”, Journal of Applied Physics, Vol. 93, No.9, pp. 5794-5811, 2003. [23] 陶雨台,表面物理化學,千華出版公司,1988 [24] 莊達人,VLSI製造技術,高立圖書有限公司,2000。

The aim of this study was developing a novel asymmetric microlens array with specific inclined angles and non-normal line imagery capture feature. In the experiments, several designed mask were used in photolithography processes with innovative offset alignment technique for fabricating off-axis photoresist structure. Through thermal-reflow process, the structure will turn into asymmetric microlens. This paper derived the relationship between controlling variable factors and asymmetric microlens array profile, such as inclined angle and lens sag height. In this study, the controlling variable factors contained masks choosing, offset alignment displacement and photoresist thermal reflow time. On the other hand, due to the microlens array in this thesis was fabricated to apply for focus imaging or signal processing in optics, therefore, we analyzed the microlens profile data with curve-fitting method to find focusable area of microlens. In this thesis, the asymmetric microlens array with inclined angles between 15° to 26°, lens sag height 25μm, focusable area up to 3800μm2 have been produced successfully.
其他識別: U0005-1808201116303100
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