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標題: 以偏軸曝光方式製作非對稱微透鏡陣列之研究
Fabrication of Asymmetrical Microlens-Array by Off-axis Exposure Method
作者: 張博森
Chang, Po-sen
關鍵字: 偏軸;off-axis;非對稱;微透鏡陣列;二次曝光;asymmetric;microlens array
出版社: 精密工程學系所
引用: [1] 行政院國家科學委員會,微機電系統技術與應用,民國92年7月。 [2] Z. D. Popovic, R. A. Sprague, and G. A. Neville Connell, “Technique for monolithic fabrication of microlens arrays,” Applied Optics, vol. 27, No.7, pp. 1281-1284, 1988. [3] D. L. MacFarlane, V. Narayan, J. A. Tatum, W. R. Cox, T. Chen, and D. J. Hayes, “Microjet Fabrication of Microlens Arrays,” IEEE Photonics Technology Letters, VOL. 6, NO. 9, PP 1112-1114, 1994. [4] M. R. Wang, and H. Su, “Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication,” Applied Optics, vol. 37, No.32, pp. 7568-7576, 1998. [5] H. Hocheng, and K. Y. Wang, “Analysis and fabrication of minifeature lamp lens by excimer laser micromachining,” Applied Optics, vol. 46, No.29, pp. 7184-7189, 2007. [6] C. C. A. Chen, C. M. Chen, and J. R. Chen, “Toolpath generation for diamond shaping of aspheric lens array,” Journal of Materials Processing Technology, pp. 194-199, 2007. [7] K. Naessens, H. Ottevaere, P. V. Daele, R. Baets, “Flexible fabrication of microlenses in polymer layers with excimer laser ablation,” Applied Surface Science, vol. 208-209, pp. 159-164, 2003. [8] Y. Sun and S. R. Forrest, “Organic light emitting devices with enhanced outcoupling via microlenses fabricated by imprint lithography,” Journal of Applied Physics, vol. 100, pp. 073106, 2006. [9] Q. Xu “Step Heat-Forming Photoresist Method for Expanding the N. A. Range of Refractive Microlens,” Acta Optica Sinica, vol. 18, pp. 1128, 1998. [10] S. Sinzinger, and J. Jahns, Microoptics, WILEY-VCH Verlag GmbH, Weinheim, pp. 85-103, 1999. [11] Z. D. Popovic, R. A. Sprague and G. A. N. Connell, “Technique for the monolithic fabrication of microlens arrays,” Applied Optics, vol. 27, pp. 1281-1284, 1988. [12] P. Nussbaum, R. Volkel, H. P. Herzig, M. Eisner, and S. Haselbeck, “Design, Fabrication and Testing of Microlens Arrays for Sensors and Microsystems,” Pure and Applied Optics, vol. 6, pp. 617-636, 1997. [13] 梁逸平,熔融法折射式微透鏡陣列之設計製造與檢測,中央大學光電科學研究所碩士論文,2001。 [14] W. R. Cox, T. Chen, and D. Hayes, “Micro-optics fabrication by ink-jet printing,” Optics & Photonics News, vol. 12, pp. 32-35, 2001. [15] C. S. Lee, and C.H. Han, “A novel refractive silicon microlens array using bulk micromachining technology,” Sensors and Actuators, vol. 88, pp.87-90, 2001.

The manufacturing method uses two lithography process to produce an off-step structure in photoresist. Then the photoresist structure can be produced to the asymmetric microlens array by thermal reflow. In the experiments, two sets of photomask, including 500 and 400μm in diameter were uses to produce the base layer. The patterns on the second layer were designed to one-fifth, one-fourth, one-third, and half size of the base diameter. Two layers were off-sef by 20%, 40%, 60%, 80%, and 100% to exposure and development. There were resulted in the off-axis two layer structures, and completed to asymmetric microlens array by thermal reflow . the objective was to investigate different patterns on second layer and different off-set affect on the asymmetric microlens array, by using proper parameters related to the pattern size and offset distance between two layers. The highest inclination angle 81° asymmetric microlens can be produced.
其他識別: U0005-2208201214272600
Appears in Collections:精密工程研究所

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