Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/4316
標題: 氮化鎵/氧化鋁酸鋰與氮化鎵/氧化鎵酸鋰異質界面結構之第一原理研究
Ab-initio Study of GaN(1-100)/LiAlO2(100) and GaN(1-100)/LiGaO2(100Heterostructures
作者: 周彥廷
Chou, Yen-Ting
關鍵字: 第一原理;First-principles calculations;價帶偏移;氮化鎵;氧化鋁酸鋰;氧化鎵酸鋰;GaN;LiAlO2;LiGaO2;valence band offset
出版社: 精密工程學系所
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摘要: 
本研究係利用第一原理(Ab initio)計算氮化鎵(1-100)與氧化鋁酸鋰(100)以及氮化鎵(1-100)與氧化鎵酸鋰(100)之異質界面結構(Heterointerface structure),並分別探討氮化鎵/氧化鋁酸鋰異質界面與氮化鎵/氧化鎵酸鋰異質界面可能性並建立模型。我們由能帶偏移(Band offset)程度之大小對異質界面結構進行特性分析,最佳化之氮化鎵(1-100)與氧化鋁酸鋰(100)異質界面結構係以(1).配位數4之N原子、鍵結包括2個N─Ga鍵、1個N─Li鍵及1個N─Al鍵與(2).配位數4之Ga原子,鍵結包括2個Ga─N鍵、2個Ga─O鍵。另在最佳化之氮化鎵/氧化鎵酸鋰異質界面結構係以(1).配位數4之N原子,鍵結包括3個N─Ga鍵與1個N─Li鍵及(2).配位數4之Ga原子,鍵結包括2個Ga─N鍵、2個Ga─O鍵,由能帶偏移計算結果得出氮化鎵(1-100)與氧化鋁酸鋰(100)與氮化鎵(1-100)與氧化鎵酸鋰(100)最低值分別為0.534 eV與0.343 eV,證實能帶偏移量對於異質界面結構之原子鍵長改變量或異質界面應變量成正比關係。

First-principles calculations were used to determine the heterojunctions of GaN(1-100) films grown on LiAlO2(100) and LiGaO2(100) templates. The relative stability of eight different heteroepitaxial models for GaN(1-100)/LiAlO2(100) and GaN(1-100)/LiGaO2(100) interface is examined as a function of the valence band offset. The results show that the most favorable heterojunction has the lowest valence band offset of 0.534 eV and consists of fourfold-coordinated N (one N─Li, one N─Al and two N─Ga bonds) and Ga (two Ga─N and two Ga─O bonds). The relative stability of seven different heteroepitaxial models for GaN(1-100)/LiGaO2(100) interface is also examined as a function of the valence band offset. It is indicated that the most favorable heterojunction has the lowest valence band offset of 0.343 eV and consists of fourfold-coordinated N (one N─Li, three N─Ga bonds) and Ga (two Ga─N and two Ga─O bonds). Our simulations clearly show that valence band offsets are proportional to interfacial strain.
URI: http://hdl.handle.net/11455/4316
其他識別: U0005-0107201316515900
Appears in Collections:精密工程研究所

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