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|標題:||Microstructure characterization of multilayered TiSiN/CrN thin films||作者:||Yang, S.M.
|關鍵字:||TiSiN/CrN;cathodic arc evaporation;amorphous silicon nitride;multilayer coating.;ti-si-n;arc deposition process;mechanical-properties;thermal-stability;oxidation resistance;coating layers;behavior;system;ti1-xalxn;hardness||Project:||Journal of Nanoscience and Nanotechnology||期刊/報告no：:||Journal of Nanoscience and Nanotechnology, Volume 8, Issue 5, Page(s) 2688-2692.||摘要:||
Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (/([TiSi])/1([Cr])) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Lambda) of the TiSiN/CrN deposited at /([TiSi])//([Cr]) cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller /([TiSi])//([Cr]) cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.
|Appears in Collections:||材料科學與工程學系|
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