Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43327
標題: Thermal Stability of TiAlN and Nanocomposite TiAlSiN Thin Films
作者: Yang, S.M.
吳威德
Chang, Y.Y.
Lin, D.Y.
Wang, D.Y.
Wu, W.T.
關鍵字: Oxidation;Hard Coatings;Cathodic Arc Evaporation System;high-temperature oxidation;si-n coatings;elastic behavior;nitride;coatings;deposition;system;resistance;kinetics;tin
Project: Journal of Nanoscience and Nanotechnology
期刊/報告no:: Journal of Nanoscience and Nanotechnology, Volume 9, Issue 2, Page(s) 1108-1112.
摘要: 
TiAlN and TiAlSiN coatings were synthesized by a cathodic arc deposition process. Titanium, Ti(50)Al(50) alloy and AlSi (88 at.% of Al and 12 at.% of Si) alloy targets were adopted as the cathode materials. X-ray diffraction analyses revealed that Ti(0.5)Al(0.5)N and Ti(49)Al(0.44)Si(0.07)N possess a B1-NaCl crystal structure. The lattice constants of the Ti(0.5)Al(0.5)N and Ti(0.49)Al(0.44)Si(0.07)N calculated from XRD pattern were 0.418 nm and 0.422 nm, respectively. For the high temperature oxidation test, the coated samples were annealed at 900 degrees C in air atmosphere for 2 hours. In this study, the deposited Ti(0.5)Al(0.5)N had completely transformed to TiO(2) and Al(2)O(3), and Ti(0.49)Al(0.44)Si(0.07)N remained the as-deposited structure after oxidation treatment. It indicated that Ti(0.49)Al(0.44)Si(0.07)N possesses superior oxidation resistance than Ti(0.5)Al(0.5)N, due to the amorphous SiNx phase existed in the nanocomposite structure. The different oxidation mechanisms of Ti(50)Al(50)N and Ti(0.49)Al(0.44)Si(0.07)N at high temperature of 900 degrees C are developed in this study.
URI: http://hdl.handle.net/11455/43327
ISSN: 1533-4880
DOI: 10.1166/jnn.2009.C098
Appears in Collections:材料科學與工程學系

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