Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43385
標題: Plasma analyses and structural properties of Cr-N-C-O coatings synthesized by a cathodic arc evaporation process
作者: Chang, Y.Y.
吳威德
Yang, S.J.
Wu, W.T.
關鍵字: Hard coating;Cathodic-arc evaporation;Physical vapor deposition;Nanostructure;ion-implantation;chromium;films;pvd
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 517, Issue 14, Page(s) 4238-4241.
摘要: 
Recently, nanocomposite coatings have attracted much interest because of their excellent mechanical performance and chemical stability. In this study, Cr-N-C-O nanocomposite coatings were synthesized by cathodic-arc evaporation with plasma enhanced duct equipment. Nitrogen and CO(2) reactive gases were introduced to react with chromium to form Cr-N-C-O nanocomosite coatings during the deposition process. The plasma in a cathodic arc evaporation process used for the deposition of Cr-N-C-O coatings was studied by an optical emission spectrometer (OES). With the introduction of nitrogen and CO(2) reactive gases into the chamber, high density of evaporated chromium catalyzes the decomposition of nitrogen and CO(2) reactive gases, and induces the formation of Cr-N-C-O films. The emission intensity of Cr atoms decreased with increasing N(2)/(N(2) + CO(2)) flow rate ratio. It showed the deposition rate increased at higher CO(2) flow rate. A nanocomposite structure of coexisting CrN, Cr(2)N and Cr(2)O(3) crystallites and amorphous carbon phases was found in the Cr-N-C-O coatings. (C) 2009 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43385
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.02.033
Appears in Collections:材料科學與工程學系

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