Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43410
標題: Degradation of ZrN films at high temperature under controlled atmosphere
作者: Lu, F.H.
呂福興
Lo, W.Z.
關鍵字: thin-films;oxidation-kinetics;hard coatings;tin films;crn
Project: Journal of Vacuum Science & Technology A
期刊/報告no:: Journal of Vacuum Science & Technology A, Volume 22, Issue 5, Page(s) 2071-2076.
摘要: 
The degradation of ZrN films deposited onto Si substrates by unbalanced magnetron sputtering was investigated over temperatures of 300-1200 degreesC in different atmospheres by analyzing changes in color and appearance, as well as microstructures. The atmospheres contained air, nitrogen, and forming gas (N(2)/H(2)=9), which exhibited drastically different oxygen/nitrogen partial pressure ratios. The resultant degradation included mainly color changes and formation of blisters on the film surface. Color change was associated with the oxidation of the nitride film, which was analyzed by looking into the Gibbs free-energy changes at various temperatures and oxygen partial pressures. Two types of blisters occurred at different temperature ranges. Several large round blisters, denoted as A-type blisters, occurring at low temperatures originated from the large residual stress in the films. Many small irregular blisters, denoted as B-type blisters, appearing at relatively high temperatures resulted from the oxidation of the film. (C) 2004 American Vacuum Society.
URI: http://hdl.handle.net/11455/43410
ISSN: 0734-2101
DOI: 10.1116/1.1786308
Appears in Collections:材料科學與工程學系

Show full item record
 

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.