Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43425
標題: Characterization of Cr-doped TiO2 thin films prepared by cathodic arc plasma deposition
作者: Chan, M.H.
呂福興
Ho, W.Y.
Wang, D.Y.
Lu, F.H.
關鍵字: Cr-doped;titanium dioxide;cathodic arc evaporation;super-hydrophilicity;photocatalysts;evaporation;chromium;nitrogen
Project: Surface & Coatings Technology
期刊/報告no:: Surface & Coatings Technology, Volume 202, Issue 4-7, Page(s) 962-966.
摘要: 
Cr-doped TiO2 thin films were prepared by co-sputtering of titanium and chromium in a cathodic arc plasma evaporation system. X-ray diffraction (XRD), Auger electron spectroscopy (AES), field emission scanning electron microscopy (FE-SEM), and water contact angle measurement were used to characterize obtained films. As-deposited pure titanium dioxide thin films possessed a mostly anatase structure while Cr-doped TiO2 films was amorphous. After annealing at 450 degrees C for 3 h, amorphous Cr-doped TiO2, films transformed to a mixed anatase (mostly) and rutile phase. Changes in the morphology and composition of the films were examined by FE-SEM and AES. Crystalline Cr-doped TiO2 films became super-hydrophilic after 20 min of exposure under visible light illumination, indicating that the absorption edge shifted from an ultraviolet region for TiO2 to a visible light range for annealed Cr-doped TiO2, films, which is further confirmed by UV-visible spectra. (c) 2007 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43425
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2007.05.045
Appears in Collections:材料科學與工程學系

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