Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43435
標題: Microstructure evolution of ZrN films annealed in vacuum
作者: Chieh, Y.C.
呂福興
Lo, W.Z.
Lu, F.H.
關鍵字: ZrN films;annealing;microstructure;stress;Young's Modulus;improved corrosion-resistance;tin films;controlled-atmosphere;high-temperature;hard coatings;nitride films;degradation
Project: Surface & Coatings Technology
期刊/報告no:: Surface & Coatings Technology, Volume 200, Issue 10, Page(s) 3336-3340.
摘要: 
Microstructure changes of ZrN films deposited onto Si substrates by unbalanced magnetron sputtering were investigated over temperatures of 200-1100 degrees C in vacuum. The microstructure and morphology of the films were investigated by means of X-ray diffraction and field-emission scanning electron microscopy. The residual stress was determined using a laser scanning curvature measurement method. Neither color change nor oxides could be discerned over the whole investigated temperature. Scarce round micro-blisters, due to the increase of residual compressive stress in the films, were found above 400 degrees C. The texture coefficient, lattice parameter, and average strain of the films varied with annealing temperature. The measured residual stresses reached a minimum, i.e., -7.0 GPa at 400 degrees C. Subsequently, the stress relaxed with temperature and became tensile at 1000 degrees C. Additionally, the Young's Modulus of the films could be obtained from the residual stress and average strain relation. The evaluated value was 380 +/- 70 GPa, which is comparable to those reported from the literature; nevertheless, this technique is nondestructive and much simpler. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43435
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2005.07.048
Appears in Collections:材料科學與工程學系

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