Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43441
標題: The Young's modulus of chromium nitride films
作者: Chen, H.Y.
呂福興
Tsai, C.J.
Lu, F.H.
關鍵字: Young's modulus;chromium nitrides;stress;X-ray diffraction;annealing;hard coatings;thin-films;stress
Project: Surface & Coatings Technology
期刊/報告no:: Surface & Coatings Technology, Volume 184, Issue 1, Page(s) 69-73.
摘要: 
The Young's modulus of chromium nitride (CrN) films usually determined by complex and a destructive technique was obtained by conducting conventional X-ray diffraction and stress measurements. The CrN films were deposited onto (100) Si substrates by cathodic arc plasma deposition and then annealed in a N-2/H-2 = 9 reducing atmosphere between 300 and 900 degreesC. X-Ray diffraction spectra revealed that the CrN main (220) peak was shifted from lower diffraction angles toward higher diffraction angles and then back to the standard reference angle with increasing temperature. Strains of the films were calculated from the corresponding interplanar spacing change associated with the peak shift. Residual stresses were determined by the curvature changes resulted from the annealing-induced stress relaxation. The Young's modulus of CrN films was then deduced from the linear relation of stresses and strains by considering residual stresses as plane stresses. The obtained value, 190 +/- 50 GPa, is comparable with those reported in the literature. (C) 2003 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43441
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2003.10.064
Appears in Collections:材料科學與工程學系

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