Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43442
標題: Effects of MEVVA-implanted chromium on the structure and properties of CrN film
作者: Han, S.
呂福興
Chen, H.Y.
Chang, K.L.
Weng, K.W.
Wang, D.Y.
Lu, F.H.
Shih, H.C.
關鍵字: metal vapor vacuum arc;cathodic arc plasma deposition;annealing;phase;transformation;n coatings;high-temperature;microstructure;interlayer;corrosion;stress;steel
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 447, Page(s) 425-429.
摘要: 
The effect of a metal vapor vacuum arc (MEVVA)-implanted Cr interlayer on the microstructure of the CrN coating on the silicon wafer was investigated. Two types of the CrN-coated specimens were prepared with and without an MEVVA-implanted Cr interlayer-CrN/Cr/Si and CrN/Si-by cathodic arc plasma deposition. Both specimens of the same batch were annealed at 500 degreesC for 2 h in an N-2/H-2 atmosphere, to elucidate the thermal stability of the CrN film. The columnar structure of CrN/Cr/Si was observed by cross-sectional transmission electron microscopy. The X-ray diffraction results revealed the presence of CrN, and that (2 2 0) is the preferred orientation of both CrN/Si and CrN/Cr/Si. However, CrN/Si revealed a phase transformation from CrN to Cr2N during annealing, which is due largely to stress relaxation in the film. A MEVVA-implanted Cr interlayer can effectively relax the residual stress in the growing CrN of the coating and prevent a phase transformation in the CrN/Cr/Si assembly during annealing. (C) 2003 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43442
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(03)01119-2
Appears in Collections:材料科學與工程學系

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