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|標題:||X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures||作者:||Chan, M.H.
|關鍵字:||Titanium oxynitride films;Air;Sputtering;X-ray photoelectron;spectroscopy (XPS);thin-films;nitride;coatings||Project:||Thin Solid Films||期刊/報告no：:||Thin Solid Films, Volume 517, Issue 17, Page(s) 5006-5009.||摘要:||
X-ray photoelectron spectroscopy (XPS) has been employed to investigate titanium oxynitride (TiN(x)O(y)) films prepared by d.c. magnetron sputtering using air/Ar mixtures, which allows one to perform the deposition at a high base pressure (1.3 x 10(-2) Pa) and can reduce substantially the processing time. XPS analyses revealed that all the prepared TiN(x)O(y) films comprised Ti-N, Ti-N-O, and Ti-O chemical states. When the air/Ar ratio was below 0.3, nitrogen-rich TiN(x)O(y) films were obtained. As the air/Ar ratio was above 0.4, oxygen-rich TiN(x)O(y) films were formed. XPS depth profile analyses were also performed in selected specimens. It has been found that at relatively low air/Ar ratios, such as 0.5, the oxygen content of the films increased toward the film/substrate interface and when the air/Ar ratio was higher. TiN(x)O(y) films with large oxygen content with uniform concentrations were then formed. (c) 2009 Elsevier B.V. All rights reserved.
|Appears in Collections:||材料科學與工程學系|
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