Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43456
標題: X-ray photoelectron spectroscopy analyses of titanium oxynitride films prepared by magnetron sputtering using air/Ar mixtures
作者: Chan, M.H.
呂福興
Lu, F.H.
關鍵字: Titanium oxynitride films;Air;Sputtering;X-ray photoelectron;spectroscopy (XPS);thin-films;nitride;coatings
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 517, Issue 17, Page(s) 5006-5009.
摘要: 
X-ray photoelectron spectroscopy (XPS) has been employed to investigate titanium oxynitride (TiN(x)O(y)) films prepared by d.c. magnetron sputtering using air/Ar mixtures, which allows one to perform the deposition at a high base pressure (1.3 x 10(-2) Pa) and can reduce substantially the processing time. XPS analyses revealed that all the prepared TiN(x)O(y) films comprised Ti-N, Ti-N-O, and Ti-O chemical states. When the air/Ar ratio was below 0.3, nitrogen-rich TiN(x)O(y) films were obtained. As the air/Ar ratio was above 0.4, oxygen-rich TiN(x)O(y) films were formed. XPS depth profile analyses were also performed in selected specimens. It has been found that at relatively low air/Ar ratios, such as 0.5, the oxygen content of the films increased toward the film/substrate interface and when the air/Ar ratio was higher. TiN(x)O(y) films with large oxygen content with uniform concentrations were then formed. (c) 2009 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43456
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2009.03.100
Appears in Collections:材料科學與工程學系

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