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標題: | Early-stage nucleation crystallography of sensitization-activated palladium catalysts and electrolessly deposited copper films | 作者: | Sung, Y.C. 張守一 Lai, C.H. Lin, S.J. Chang, S.Y. |
關鍵字: | ultralarge-scale integration;electrochemical deposition;titanium;nitride;barrier layers;cu deposition;metallization;interconnections;growth | Project: | Electrochemical and Solid State Letters | 期刊/報告no:: | Electrochemical and Solid State Letters, Volume 9, Issue 5, Page(s) C85-C87. | 摘要: | The atomic-scale crystallography of early-stage nucleation of sensitization-activated palladium (Pd) catalysts and electrolessly plated copper (Cu) films has been investigated. Small Pd nanocrystallites of 5-10 nm were uniformly distributed as a single layer. Neighboring Pd nanocrystallites exhibited similar crystallography irrelevant to the random orientations of polycrystalline TaN substrate. Subsequently deposited Cu nanocrystallites of only 1 nm with small-angle boundaries nucleated on the Pd nanocrystallites with an orientation relationship of Cu [111] parallel to Pd [111]. In comparison, displacement-activated Pd preferentially nucleated on TaN, and Cu followed the orientation of Pd grains with a relationship of Cu [111] parallel to Pd [200]. (c) 2006 The Electrochemical Society. |
URI: | http://hdl.handle.net/11455/43577 | ISSN: | 1099-0062 | DOI: | 10.1149/1.2186027 |
Appears in Collections: | 材料科學與工程學系 |
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