Please use this identifier to cite or link to this item:
http://hdl.handle.net/11455/43577
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Sung, Y.C. | en_US |
dc.contributor.author | 張守一 | zh_TW |
dc.contributor.author | Lai, C.H. | en_US |
dc.contributor.author | Lin, S.J. | en_US |
dc.contributor.author | Chang, S.Y. | en_US |
dc.date | 2006 | zh_TW |
dc.date.accessioned | 2014-06-06T08:11:10Z | - |
dc.date.available | 2014-06-06T08:11:10Z | - |
dc.identifier.issn | 1099-0062 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11455/43577 | - |
dc.description.abstract | The atomic-scale crystallography of early-stage nucleation of sensitization-activated palladium (Pd) catalysts and electrolessly plated copper (Cu) films has been investigated. Small Pd nanocrystallites of 5-10 nm were uniformly distributed as a single layer. Neighboring Pd nanocrystallites exhibited similar crystallography irrelevant to the random orientations of polycrystalline TaN substrate. Subsequently deposited Cu nanocrystallites of only 1 nm with small-angle boundaries nucleated on the Pd nanocrystallites with an orientation relationship of Cu [111] parallel to Pd [111]. In comparison, displacement-activated Pd preferentially nucleated on TaN, and Cu followed the orientation of Pd grains with a relationship of Cu [111] parallel to Pd [200]. (c) 2006 The Electrochemical Society. | en_US |
dc.language.iso | en_US | zh_TW |
dc.relation | Electrochemical and Solid State Letters | en_US |
dc.relation.ispartofseries | Electrochemical and Solid State Letters, Volume 9, Issue 5, Page(s) C85-C87. | en_US |
dc.relation.uri | http://dx.doi.org/10.1149/1.2186027 | en_US |
dc.subject | ultralarge-scale integration | en_US |
dc.subject | electrochemical deposition | en_US |
dc.subject | titanium | en_US |
dc.subject | nitride | en_US |
dc.subject | barrier layers | en_US |
dc.subject | cu deposition | en_US |
dc.subject | metallization | en_US |
dc.subject | interconnections | en_US |
dc.subject | growth | en_US |
dc.title | Early-stage nucleation crystallography of sensitization-activated palladium catalysts and electrolessly deposited copper films | en_US |
dc.type | Journal Article | zh_TW |
dc.identifier.doi | 10.1149/1.2186027 | zh_TW |
item.grantfulltext | none | - |
item.openairetype | Journal Article | - |
item.languageiso639-1 | en_US | - |
item.fulltext | no fulltext | - |
item.cerifentitytype | Publications | - |
item.openairecristype | http://purl.org/coar/resource_type/c_18cf | - |
Appears in Collections: | 材料科學與工程學系 |
TAIR Related Article
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.