Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43631
標題: Antibacterial behavior of TaN-Ag nanocomposite thin films with and without annealing
作者: Hsieh, J.H.
張守一
Tseng, C.C.
Chang, Y.K.
Chang, S.Y.
Wu, W.
吳威德
關鍵字: Cosputtering;Nanocomposite thin films;TaN-Ag;C-AFM;coatings;deposition;silver;water
Project: Surface & Coatings Technology
期刊/報告no:: Surface & Coatings Technology, Volume 202, Issue 22-23, Page(s) 5586-5589.
摘要: 
TaN-Ag nanocomposite films were deposited by reactive cosputtering on Si. The films were then annealed using RTA (rapid thermal annealing) at 350 degrees C for 2, 4 and 8 min respectively to induce the nucleation and growth of Ag particles in TaN matrix and on film Surface. FESEM (field emission scanning electron microscopy) were applied to characterize Ag nanoparticles emerged on the surface of TaN-Ag thin films. The effect of annealing on the antibacterial properties of these films was studied. The results first confirm that annealing by RTA can cause Ag nanoparticles with various sizes to emerge on the TaN surface. Consequently, the antibacterial behavior will vary, depending on the amount and size of the surfaced Ag particles. (C) 2008 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43631
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2008.06.107
Appears in Collections:材料科學與工程學系

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