Please use this identifier to cite or link to this item:
|標題:||Antibacterial behavior of TaN-Ag nanocomposite thin films with and without annealing||作者:||Hsieh, J.H.
|關鍵字:||Cosputtering;Nanocomposite thin films;TaN-Ag;C-AFM;coatings;deposition;silver;water||Project:||Surface & Coatings Technology||期刊/報告no：:||Surface & Coatings Technology, Volume 202, Issue 22-23, Page(s) 5586-5589.||摘要:||
TaN-Ag nanocomposite films were deposited by reactive cosputtering on Si. The films were then annealed using RTA (rapid thermal annealing) at 350 degrees C for 2, 4 and 8 min respectively to induce the nucleation and growth of Ag particles in TaN matrix and on film Surface. FESEM (field emission scanning electron microscopy) were applied to characterize Ag nanoparticles emerged on the surface of TaN-Ag thin films. The effect of annealing on the antibacterial properties of these films was studied. The results first confirm that annealing by RTA can cause Ag nanoparticles with various sizes to emerge on the TaN surface. Consequently, the antibacterial behavior will vary, depending on the amount and size of the surfaced Ag particles. (C) 2008 Elsevier B.V. All rights reserved.
|Appears in Collections:||材料科學與工程學系|
Show full item record
TAIR Related Article
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.