Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43908
標題: Transparent barrier coatings for flexible organic light-emitting diode applications
作者: Wuu, D.S.
洪瑞華
Chen, T.N.
Wu, C.C.
Chiang, C.C.
Chen, Y.P.
Horng, R.H.
Juang, F.S.
武東星
關鍵字: OLEDs;parylene;permeation;silicon nitride;silicon oxide;films;devices;polymers;cracking;displays
Project: Chemical Vapor Deposition
期刊/報告no:: Chemical Vapor Deposition, Volume 12, Issue 4, Page(s) 220-224.
摘要: 
Silicon oxide (SiOx) and silicon nitride (SiNx) thin films have been deposited onto flexible polycarbonate (PC) substrates using plasma-enhanced (PE)CVD for transparent barrier applications. Comparing the internal stress, optical transparency, surface roughness, and impermeability results, a multilayer composed of parylene/SiOx/SiN(x center dot center dot center dot)parylene/SiOx/SiNx (PON...PON) is deposited on PC substrates and the optimum thicknesses of the SiNx, SiOx, and parylene layers is determined. Under optimum conditions, the water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) of SiOx(50 nm)/SiNx(50 nm) barrier coatings on PC at 80 degrees C decreases to values near 0.01 g m(-2) per day and 0.1 cm(3) m(-2) per day, respectively. To further reduce the WVTR and OTR values, parylene layers are used as a smoothing, defect-decoupling, and protective medium in the multilayer. It has been found that organic light-emitting diodes capped with double PON layers show no dark spots and exhibit better emissions than single PON layers after 100 h at 25 degrees C, and 40% relative humidity.
URI: http://hdl.handle.net/11455/43908
ISSN: 0948-1907
DOI: 10.1002/cvde.200506436
Appears in Collections:材料科學與工程學系

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