Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44069
DC FieldValueLanguage
dc.contributor.authorHorng, R.H.en_US
dc.contributor.author洪瑞華zh_TW
dc.contributor.authorWuu, D.S.en_US
dc.contributor.authorWei, S.C.en_US
dc.contributor.authorChan, S.H.en_US
dc.contributor.authorKung, C.Y.en_US
dc.contributor.author武東星zh_TW
dc.date1999zh_TW
dc.date.accessioned2014-06-06T08:11:52Z-
dc.date.available2014-06-06T08:11:52Z-
dc.identifier.issn0040-6090zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/44069-
dc.description.abstractThe persistent photoconductivity (PPC) behavior has been characterized in sputtered GaN thin films using the room illumination with a wavelength of 254 nm under a 5-V bias. It was found that the N(2) partial pressure in the sputtering atmosphere has an evident effect on the PPC behavior. The obtained data show that the nitrogen vacancy is the candidate for PPC effect in the sputtered GaN film. At lower N(2) partial pressures, the nitrogen vacancy can be induced and resulted in GaN films with more donor levels as compared with those of samples deposited at higher N(2) contents. An energy band model that can account for the experimental observation of PPC behavior is proposed. (C) 1999 Elsevier Science S.A. All rights reserved.en_US
dc.language.isoen_USzh_TW
dc.relationThin Solid Filmsen_US
dc.relation.ispartofseriesThin Solid Films, Volume 343, Page(s) 642-645.en_US
dc.relation.urihttp://dx.doi.org/10.1016/s0040-6090(98)01666-6en_US
dc.subjectpersistent photoconductivityen_US
dc.subjectsputteringen_US
dc.subjectGaNen_US
dc.titleA research on the persistent photoconductivity behavior of GaN thin films deposited by r.f. magnetron sputteringen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1016/s0040-6090(98)01666-6zh_TW
item.openairetypeJournal Article-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.languageiso639-1en_US-
item.grantfulltextnone-
item.fulltextno fulltext-
item.cerifentitytypePublications-
Appears in Collections:材料科學與工程學系
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