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http://hdl.handle.net/11455/44255| 標題: | (J.Vac.Sci.Technol.A.,23(4):1006-1009)Oxidation behavior of titanium nitride films | 作者: | H.Y.Chen F.H.Lu |
關鍵字: | titanium compounds;thin films;nanoporous materials;X-ray diffraction;Raman spectra;scanning electron microscopy;plasma deposition;annealing;granular structure;crystal microstructure;voids (solid);oxidation | 出版社: | USA:American Vacuum Society | Project: | J.Vac.Sci.Technol.A., Volume 23, Issue 4, Page(s) 1006-1009. | URI: | http://hdl.handle.net/11455/44255 |
| Appears in Collections: | 材料科學與工程學系 |
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