Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44255
標題: (J.Vac.Sci.Technol.A.,23(4):1006-1009)Oxidation behavior of titanium nitride films
作者: H.Y.Chen
F.H.Lu
關鍵字: titanium compounds;thin films;nanoporous materials;X-ray diffraction;Raman spectra;scanning electron microscopy;plasma deposition;annealing;granular structure;crystal microstructure;voids (solid);oxidation
出版社: USA:American Vacuum Society
Project: J.Vac.Sci.Technol.A., Volume 23, Issue 4, Page(s) 1006-1009.
URI: http://hdl.handle.net/11455/44255
Appears in Collections:材料科學與工程學系

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