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http://hdl.handle.net/11455/44369| 標題: | (Thin Solid Films,516(8):1876-1881)Plasma oxidation of Al thin films on Si substrates | 作者: | F.H.Lu H.D.Tsai Y.C.Chieh |
關鍵字: | Plasma oxidation;Al thin films;Alumina;Kinetics | 出版社: | Netherlands:Elsevier | Project: | Thin Solid Films, Volume 516, Issue 8, Page(s) 1876-1881. | URI: | http://hdl.handle.net/11455/44369 |
| Appears in Collections: | 材料科學與工程學系 |
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