Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44433
標題: (Thin Solid Films, 518(5):1369-1372)Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures
作者: M. H. Chan
F. H. Lu
關鍵字: TiO2 − xNx;Reactive sputtering;Air;Band gap
出版社: Netherlands:Elsevier
Project: Thin Solid Films, Volume 518, Issue 5, Page(s) 1369-1372.
URI: http://hdl.handle.net/11455/44433
Appears in Collections:材料科學與工程學系

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