Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44948
標題: Fabrication of a micromachined tunable capacitor using the complementary metal-oxide-semiconductor post-process of etching metal layers
作者: Dai, C.L.
戴慶良
Hsu, H.M.
Liu, M.C.
Wei, M.K.
Chang, M.W.
關鍵字: tunable capacitor;comb-drive actuator;CMOS;post-process
Project: Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
期刊/報告no:: Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Volume 45, Issue 2A, Page(s) 1018-1020.
摘要: 
In this study, we investigate the fabrication of a micromechanical tunable capacitor using the commercial complementary metal-oxide-semiconductor (CMOS) process and the post-process of maskless wet etching metal layers. The post-process has merits of easy execution and low cost. The post-process uses two etchants to etch the metal layers to release the suspended structures of the tunable capacitor. The comb-drive actuator is employed to change the position of the movable plate in the parallel capacitor, such that the overlap area between the two plates in the parallel capacitor is changed. The experimental results show a capacitance of 3.5 pF and a tuning range of 3.5 : 1 at 20 V.
URI: http://hdl.handle.net/11455/44948
ISSN: 0021-4922
DOI: 10.1143/jjap.45.1018
Appears in Collections:機械工程學系所

Show full item record
 

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.