Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44973
標題: Microelectromechanical resonator manufactured using CMOS-MEMS technique
作者: Dai, C.L.
戴慶良
Kuo, C.H.
Chiang, M.C.
關鍵字: micromechanical resonator;CMOS;microactuator;etching silicon dioxide;sensor;array;micromirror;filter
Project: Microelectronics Journal
期刊/報告no:: Microelectronics Journal, Volume 38, Issue 6-7, Page(s) 672-677.
摘要: 
The fabrication of a microelectromechanical resonator using the commercial 0.35 mu m complementary metal oxide semiconductor (CMOS) process and a post-process has been implemented. The resonator requires only one wet etching post-process. The suspended structures in the resonator consist of a membrane and four beams. The post-process utilizes an etchant to etch the sacrificial layer, and to release the suspended structures. Easy execution and low cost are the advantages of the post-process. The resonator comprises a driving part and a sensing part. The sensing part produces a change in capacitance when applying a driving voltage to the driving part in the resonator. A circuitry is used to convert the capacitance variation of the sensing part into the voltage output. Experimental results show that the resonant frequency of the resonator is about 39.5 MHz and the quality factor is 806. (C) 2007 Elsevier Ltd. All rights reserved.
URI: http://hdl.handle.net/11455/44973
ISSN: 0026-2692
DOI: 10.1016/j.mejo.2007.05.008
Appears in Collections:機械工程學系所

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