Please use this identifier to cite or link to this item:
標題: A circular micromirror array fabricated by a maskless post-CMOS process
作者: Cheng, Y.C.
Dai, C.L.
Lee, C.Y.
Chen, P.H.
Chang, P.Z.
關鍵字: micromachined optical switches;mirror
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 11, Issue 6, Page(s) 444-451.
This work studies the fabrication of a circular micromirror array by the standard 0.35 mu m SPFM (Single Polysilicon Four Metals) CMOS (complementary metal oxide semiconductor) process and a maskless post-process. The advantages of the post-process are its compatibility with conventional CMOS process and this method provides a way to designer to quickly construct micromachined structures using the standardized procedures. The mentioned circular micromirror array that contains 10 x 10 micromirror switches is integrated with a 1 x 8 de-multiplexer control circuit and a four-stage charge pump on a chip. The radius of each micromirror is about 25 im, and the gap from the bottom electrode to the top mirror plate is about 5 mu m. The micromirror array is actuated using an electrostatic force. Simulated results show that the micromirror has a tilting angle of around 9 degrees at a driving voltage of 30 V. The root-mean-square roughness and the average roughness of the mirror surface are measured at 15.31 nm and 12.58 nm respectively. In addition, the first and the second mode of natural frequency of the micromirror switch are around 492 KHz and 508 KHz, respectively.
ISSN: 0946-7076
DOI: 10.1007/s00542-004-0486-0
Appears in Collections:機械工程學系所

Show full item record

Google ScholarTM




Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.