Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44980
標題: A micromachined tunable resonator fabricated by the CMOS post-process of etching silicon dioxide
作者: Dai, C.L.
戴慶良
Yu, W.C.
關鍵字: vibration;filters
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 12, Issue 8, Page(s) 766-772.
摘要: 
This work investigates the fabrication of a micromechanical tunable resonator using the commercial 0.35 mu m complementary metal oxide semiconductor (CMOS) process and the post-process of only one maskless wet etching. The post-process has advantages of easy execution and low cost. The post-process employs an etchant (silox vapox III) to etch the silicon dioxide layer to release the suspended structures of the resonator. The tunable resonator comprises a driving unit, a tuning unit and a sensing unit. The resonant frequency of the resonator can be tuned using a dc-biased electrostatic comb of linearly varied finger-length. Experimental results show that the resonant frequency of the resonator is about 4.8 kHz, and it has a frequency-tuning range of 6.8% at the tuning voltage of 0-25 V.
URI: http://hdl.handle.net/11455/44980
ISSN: 0946-7076
DOI: 10.1007/s00542-005-0077-8
Appears in Collections:機械工程學系所

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