Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44980
DC FieldValueLanguage
dc.contributor.authorDai, C.L.en_US
dc.contributor.author戴慶良zh_TW
dc.contributor.authorYu, W.C.en_US
dc.date2006zh_TW
dc.date.accessioned2014-06-06T08:14:13Z-
dc.date.available2014-06-06T08:14:13Z-
dc.identifier.issn0946-7076zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/44980-
dc.description.abstractThis work investigates the fabrication of a micromechanical tunable resonator using the commercial 0.35 mu m complementary metal oxide semiconductor (CMOS) process and the post-process of only one maskless wet etching. The post-process has advantages of easy execution and low cost. The post-process employs an etchant (silox vapox III) to etch the silicon dioxide layer to release the suspended structures of the resonator. The tunable resonator comprises a driving unit, a tuning unit and a sensing unit. The resonant frequency of the resonator can be tuned using a dc-biased electrostatic comb of linearly varied finger-length. Experimental results show that the resonant frequency of the resonator is about 4.8 kHz, and it has a frequency-tuning range of 6.8% at the tuning voltage of 0-25 V.en_US
dc.language.isoen_USzh_TW
dc.relationMicrosystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systemsen_US
dc.relation.ispartofseriesMicrosystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 12, Issue 8, Page(s) 766-772.en_US
dc.relation.urihttp://dx.doi.org/10.1007/s00542-005-0077-8en_US
dc.subjectvibrationen_US
dc.subjectfiltersen_US
dc.titleA micromachined tunable resonator fabricated by the CMOS post-process of etching silicon dioxideen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1007/s00542-005-0077-8zh_TW
item.openairetypeJournal Article-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.languageiso639-1en_US-
item.grantfulltextnone-
item.fulltextno fulltext-
item.cerifentitytypePublications-
Appears in Collections:機械工程學系所
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