Please use this identifier to cite or link to this item:
標題: Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique
作者: Kao, P.H.
Dai, C.L.
Hsu, C.C.
Wu, C.C.
關鍵字: micromirror array;microactuator;CMOS-MEMS;optical switch;fabrication;circuits;device;mirror;sensor
Project: Sensors
期刊/報告no:: Sensors, Volume 9, Issue 8, Page(s) 6219-6231.
In this study we used the commercial 0.35 mu m CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55 degrees when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.
ISSN: 1424-8220
DOI: 10.3390/s90806219
Appears in Collections:機械工程學系所

Show full item record

Google ScholarTM




Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.