Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/45092
標題: (IEEE Transactions on Semiconductor Manufacturing,15(1):039-044)Hydrodynamic Characteristics of the Thin Fluid Film in Chemical-Mechanical Polishing
作者: J. M. Chen
Y. C. Fang
關鍵字: Hydrodynamic;Characteristics;the Thin Fluid Film;Chemical-Mechanical Polishing
出版社: European:IEEE Components, Hybrids, and Manufacturing Technology Society; European:IEEE Electron Devices Society; European:IEEE Reliability Society; European:IEEE Solid-State Circuits Council; European:Institute of Electrical and Electronics Engineers, Institute of Electrical and Electronics Engineers (IEEE)
Project: IEEE Transactions on Semiconductor Manufacturing, Volume 15, Issue 1, Page(s) 39-44.
URI: http://hdl.handle.net/11455/45092
Appears in Collections:機械工程學系所

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