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|標題:||(IEEE Transactions on Semiconductor Manufacturing,15(1):039-044)Hydrodynamic Characteristics of the Thin Fluid Film in Chemical-Mechanical Polishing||作者:||J. M. Chen
Y. C. Fang
|關鍵字:||Hydrodynamic;Characteristics;the Thin Fluid Film;Chemical-Mechanical Polishing||出版社:||European:IEEE Components, Hybrids, and Manufacturing Technology Society; European:IEEE Electron Devices Society; European:IEEE Reliability Society; European:IEEE Solid-State Circuits Council; European:Institute of Electrical and Electronics Engineers, Institute of Electrical and Electronics Engineers (IEEE)||Project:||IEEE Transactions on Semiconductor Manufacturing, Volume 15, Issue 1, Page(s) 39-44.||URI:||http://hdl.handle.net/11455/45092|
|Appears in Collections:||機械工程學系所|
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