Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46404
標題: A neural-Taguchi-based quasi time-optimization control strategy for chemical-mechanical polishing processes
作者: Wang, G.J.
王國禎
Chou, M.H.
關鍵字: chemical mechanical polishing;neural-Taguchi method;time-optimal;process control
Project: International Journal of Advanced Manufacturing Technology
期刊/報告no:: International Journal of Advanced Manufacturing Technology, Volume 26, Issue 7-8, Page(s) 759-765.
摘要: 
Besides the major factors such as the down force, back pressure and the rotating speed of wafer carrier, effect of polishing time is also an important issue in CMP processes. In this study, a neural-Taguchi method based on a cost-effective quasi time-optimisation technique for chemical-mechanical polishing (CMP) processes is developed. The key concept of this new technique is that an optimal process parameter set is obtained through a neural-network-simulated CMP process model. Under such an optimal parameter set, the desired material removal rate within-wafer-nonuniformity can be reached with the optimal polishing time. It has been proved by experiment that the proposed method can offer a better polishing performance while reducing the polishing time by 1/3.
URI: http://hdl.handle.net/11455/46404
ISSN: 0268-3768
DOI: 10.1007/s00170-003-1859-8
Appears in Collections:生醫工程研究所

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