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|標題:||Temperature-dependent microtensile testing of thin film materials for application to microelectromechanical system||作者:||Lin, M.T.
|關鍵字:||freestanding gold-films;mechanical-properties;tensile behavior;mems;materials;grained films;plasticity||Project:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems||期刊/報告no：:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 12, Issue 10-11, Page(s) 1045-1051.||摘要:||
A specially designed microtensile apparatus capable of carrying out a series of tests on microscale thin films for microelectromechanical system (MEMS) applications at room temperature and at temperature up to 400 degrees C has been developed and tested, and is described here. Several MEMS-applicable thin films were measured with it, including thermally grown silicon dioxide, gold, and gold-vanadium. The silicon dioxide was tested at room temperature. Gold and gold-vanadium films were tested at room temperature and at 200 and 400 degrees C. Examples of these results are presented.
|Appears in Collections:||精密工程研究所|
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