Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46619
標題: Temperature-dependent microtensile testing of thin film materials for application to microelectromechanical system
作者: Lin, M.T.
林明澤
El-Deiry, P.
Chromik, R.R.
Barbosa, N.
Brown, W.L.
Delph, T.J.
Vinci, R.P.
關鍵字: freestanding gold-films;mechanical-properties;tensile behavior;mems;materials;grained films;plasticity
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 12, Issue 10-11, Page(s) 1045-1051.
摘要: 
A specially designed microtensile apparatus capable of carrying out a series of tests on microscale thin films for microelectromechanical system (MEMS) applications at room temperature and at temperature up to 400 degrees C has been developed and tested, and is described here. Several MEMS-applicable thin films were measured with it, including thermally grown silicon dioxide, gold, and gold-vanadium. The silicon dioxide was tested at room temperature. Gold and gold-vanadium films were tested at room temperature and at 200 and 400 degrees C. Examples of these results are presented.
URI: http://hdl.handle.net/11455/46619
ISSN: 0946-7076
DOI: 10.1007/s00542-006-0129-8
Appears in Collections:精密工程研究所

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