Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46620
標題: The influence of vanadium alloying on the elevated-temperature mechanical properties of thin gold films
作者: Lin, M.T.
林明澤
Chrornik, R.R.
Barbosa, N.
El-Deiry, P.
Hyun, S.
Brown, W.L.
Vinci, R.P.
Delph, T.J.
關鍵字: gold;vanadium;creep;stress relaxation;yield stress;tensile behavior;grained films
Project: Thin Solid Films
期刊/報告no:: Thin Solid Films, Volume 515, Issue 20-21, Page(s) 7919-7925.
摘要: 
Microtensile tests were performed on a series of free-standing gold and gold-vanadium thin films at 200 degrees C and 400 degrees C. At these temperatures, significant strain rate and stress relaxation effects were observed, indicating the presence of substantial inelastic deformation at all compositions. The addition of vanadium was associated with higher proportional limit and reduced stress relaxation. However, despite the formation of a solid solution at all compositions studied, the expected dependence of strength on V concentration was not observed. The primary effect of vanadium alloying in gold films was to reduce the grain size, which was the likely cause of the increased resistance to inelastic deformation. (C) 2007 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/46620
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2007.04.025
Appears in Collections:精密工程研究所

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