Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46642
標題: Concave microlens array mold fabrication in photoresist using UV proximity printing
作者: 楊錫杭
Lin, T.H.
Yang, H.
Chao, C.K.
關鍵字: laser-diode;performance;deposition;lens
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 13, Issue 11-12, Page(s) 1537-1543.
摘要: 
This paper presents a simple and effective method for fabricating a polydimethyl-siloxane (PDMS) microlens array with a high fill factor. The proposed method utilizes the UV proximity printing and photoresist replication methods. A concave microlens array mold is made using a printing gap in a lithography process. Optical UV light diffraction of UV light is used to deflect light away from the aperture edges to produce a certain exposure in the photo-resist material outside the aperture edges. This method can precisely control the geometric profile of a concave microlens array. The experimental results show that a concave micro-lens array can be formed automatically in photo-resist when the printing gap ranges from 240 to 720 mu m. A high fill factor microlens array can be produced when the control pitch distance between the adjacent apertures of the concave microlens array is decreased to the aperture size.
URI: http://hdl.handle.net/11455/46642
ISSN: 0946-7076
DOI: 10.1007/s00542-006-0264-2
Appears in Collections:精密工程研究所

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