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|標題:||Fast patterning microstructures using inkjet printing conformal masks||作者:||Lin, C.H.
|關鍵字:||lithography;fabrication||Project:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems||期刊/報告no：:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 14, Issue 9-11, Page(s) 1263-1267.||摘要:||
The presented paper describes a novel process using inkjet printing to pattern a conformal (built-on) mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing conformal mask include no Cr photomask required, suitable for non-planar substrate, scalable for large area, and extreme low cost. The ink is ejected from the inkjet print-head controlled by the inkjet system. A CAD pattern from the designer can use this process to place the pattern ink onto the photoresist substrate. A conformal mask (made of ink) was directly built-on the photoresist substrate. The dried ink thickness has to be more than 1.8 mu m thick as UV absorber. Following UV exposure, development, and ink removal, the designed microstructure patterns can be realized in photoresist such as microchannels and micro-columns.
|Appears in Collections:||精密工程研究所|
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