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標題: Fast patterning microstructures using inkjet printing conformal masks
作者: Lin, C.H.
Yang, H.
Chang, F.Y.
Chang, S.H.
Yen, M.T.
關鍵字: lithography;fabrication
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 14, Issue 9-11, Page(s) 1263-1267.
The presented paper describes a novel process using inkjet printing to pattern a conformal (built-on) mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing conformal mask include no Cr photomask required, suitable for non-planar substrate, scalable for large area, and extreme low cost. The ink is ejected from the inkjet print-head controlled by the inkjet system. A CAD pattern from the designer can use this process to place the pattern ink onto the photoresist substrate. A conformal mask (made of ink) was directly built-on the photoresist substrate. The dried ink thickness has to be more than 1.8 mu m thick as UV absorber. Following UV exposure, development, and ink removal, the designed microstructure patterns can be realized in photoresist such as microchannels and micro-columns.
ISSN: 0946-7076
DOI: 10.1007/s00542-007-0521-z
Appears in Collections:精密工程研究所

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