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|標題:||New high fill-factor triangular microlens array fabrication method using UV proximity printing||作者:||Lin, T.H.
|關鍵字:||thermal reflow process||Project:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems||期刊/報告no：:||Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 15, Issue 8, Page(s) 1255-1261.||摘要:||
A simple and effective method for fabricating a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling the printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated in photoresist. This is because to the UV light diffraction deflects away from the aperture edges and produces a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of a high fill-factor triangular microlens array. The experimental results showed that the triangular photoresist microlens array could be formed automatically when the printing gap ranged from 240 to 840 mu m. The gapless triangular microlens array will be used to increase the luminance for the backlight module of liquid crystal displays.
|Appears in Collections:||精密工程研究所|
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