Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46651
DC FieldValueLanguage
dc.contributor.authorLin, T.H.en_US
dc.contributor.author楊錫杭zh_TW
dc.contributor.authorYang, H.H.en_US
dc.contributor.authorChao, C.K.en_US
dc.contributor.authorHung, S.Y.en_US
dc.date2009zh_TW
dc.date.accessioned2014-06-06T08:20:31Z-
dc.date.available2014-06-06T08:20:31Z-
dc.identifier.issn0946-7076zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/46651-
dc.description.abstractA simple and effective method for fabricating a high fill-factor triangular microlens array using the proximity printing in lithography process is reported. The technology utilizes the UV proximity printing by controlling the printing gap between the mask and substrate. The designed approximate triangle microlens array pattern can be fabricated in photoresist. This is because to the UV light diffraction deflects away from the aperture edges and produces a certain exposure in photoresist material outside the aperture edges. This method can precisely control the geometric profile of a high fill-factor triangular microlens array. The experimental results showed that the triangular photoresist microlens array could be formed automatically when the printing gap ranged from 240 to 840 mu m. The gapless triangular microlens array will be used to increase the luminance for the backlight module of liquid crystal displays.en_US
dc.language.isoen_USzh_TW
dc.relationMicrosystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systemsen_US
dc.relation.ispartofseriesMicrosystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 15, Issue 8, Page(s) 1255-1261.en_US
dc.relation.urihttp://dx.doi.org/10.1007/s00542-008-0728-7en_US
dc.subjectthermal reflow processen_US
dc.titleNew high fill-factor triangular microlens array fabrication method using UV proximity printingen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1007/s00542-008-0728-7zh_TW
item.openairetypeJournal Article-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.grantfulltextnone-
item.fulltextno fulltext-
item.cerifentitytypePublications-
item.languageiso639-1en_US-
Appears in Collections:精密工程研究所
Show simple item record
 

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.