Please use this identifier to cite or link to this item:
標題: High-aspect-ratio microstructural posts electroforming modeling and fabrication in LIGA process
作者: Yang, H.
Chein, R.Y.
Tsai, T.H.
Chang, J.C.
Wu, J.C.
關鍵字: HARM;ion concentration;current density;aspect ratio;electroforming;electrodeposition
Project: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems
期刊/報告no:: Microsystem Technologies-Micro-and Nanosystems-Information Storage and Processing Systems, Volume 12, Issue 3, Page(s) 187-192.
This paper describes a theoretical model that predicts the metal ion concentration distribution during electroforming high aspect ratio microstructures (HARM). The applied current density and microstructure aspect ratio were found as two important factors that affect the electroforming outcome. The analytical results are verified using experiments that electroforming microstructural posts with an aspect ratio of 10. Good agreement was obtained between the experimental and analytical solutions. Based on the ion concentration analytical prediction on the cathode surface, one can estimate the electroforming time required for fabricating a microstructure for a given aspect ratio.
ISSN: 0946-7076
DOI: 10.1007/s00542-005-0050-6
Appears in Collections:精密工程研究所

Show full item record

Google ScholarTM




Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.