Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/47462
DC FieldValueLanguage
dc.contributor.author吳宗明zh_TW
dc.contributor.other中興大學材料工程研究所zh_TW
dc.contributor.other行政院國家科學委員會zh_TW
dc.date2003zh_TW
dc.date.accessioned2014-06-06T08:24:31Z-
dc.date.available2014-06-06T08:24:31Z-
dc.identifierNSC91-2216-E005-022zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/47462-
dc.language.isozh_TWzh_TW
dc.subject應用研究zh_TW
dc.subject材料科技zh_TW
dc.titleCharacterization of Plasma Treatment on Flexible Substrates (I)en_US
dc.title介電鍍膜低溫製程之開發與其在前瞻資訊產業之應用-子計畫I:前瞻性可撓性基材開發與電漿表面處理特性研究(I)zh_TW
dc.typeResearch Reportszh_TW
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.languageiso639-1zh_TW-
item.fulltextno fulltext-
item.grantfulltextnone-
item.openairetypeResearch Reports-
Appears in Collections:材料科學與工程學系
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