Oxidation and Degradation of Nitride Films at High Temperature under Controlled Atmosphere and In Plasma Environment(II)

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Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/47534

標題:	Oxidation and Degradation of Nitride Films at High Temperature under Controlled Atmosphere and In Plasma Environment(II) 氮化物鍍膜在高溫控制氣氛與電漿環境下之氧化與劣化及相關性質研究(II)
作者:	呂福興
關鍵字:	材料科技;應用研究
URI:	http://hdl.handle.net/11455/47534
其他識別:	NSC94-2216-E005-004
Appears in Collections:	材料科學與工程學系

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