Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/56275
DC FieldValueLanguage
dc.contributor劉緒倫zh_TW
dc.contributor.author呂福興zh_TW
dc.contributor.authorLU, FU HSINGen_US
dc.contributor.author李念庭zh_TW
dc.contributor.author范慧屏zh_TW
dc.contributor.author姚力仁zh_TW
dc.contributor.author詹慕萱zh_TW
dc.contributor.authorLEE, NIEN TINGen_US
dc.contributor.authorFAN, HUNG PINGen_US
dc.contributor.authorYAO, LI RENen_US
dc.contributor.authorCHAN, MU HSUANen_US
dc.date2011-06zh_TW
dc.date.accessioned2014-06-06T09:05:38Z-
dc.date.available2014-06-06T09:05:38Z-
dc.identifier.urihttp://hdl.handle.net/11455/56275-
dc.description.abstract一種金屬薄膜之物理氣相沉積方法,可用以製備鈦、鋁與鈦鋁合金之金屬薄膜,其步驟包含有:於一密閉腔體內置入一基材,以及一由鈦、鋁或鈦鋁合金所製成之靶材,在該密閉腔體內抽真空達6.6×10 -4 ~1.3Pa之背景壓力後,將空氣與氬氣以流量比6/100以下進行混合後的混合氣體通入該密閉腔體,在工作壓力1.3×10 -2 Pa~1.3Pa下,施加電壓於該基材與該靶材,即可於該基材之表面沉積形成金屬薄膜。由於本發明採用隨處可得的空氣,且背景壓力要求不高,具有設備簡單、製程快速、成本低廉等優點。zh_TW
dc.language.isozh_TWzh_TW
dc.publisher材料科學與工程學系zh_TW
dc.relation.urihttp://twpat.tipo.gov.tw/tipotwoc/tipotwkmen_US
dc.title金屬薄膜之物理氣相沉積方法zh_TW
dc.typePatentzh_TW
item.fulltextno fulltext-
item.grantfulltextnone-
item.openairetypePatent-
item.languageiso639-1zh_TW-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
Appears in Collections:材料科學與工程學系
Show simple item record
 
TAIR Related Article

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.