Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/56833
標題: 浸入式傾斜角度曝光之高分子脊樑式波導結構之製法
METHOD FOR FABRICATING POLYMER RIDGED WAVEGUIDES BY USING TILTED IMMERSION LITHOGRAPHY
作者: 楊錫杭
Yang, Hsiharng
吳仲泂
Wu, Chung-Chiung
摘要: 
本發明係有關一種浸入式傾斜角度曝光之高分子脊樑式波導結構之製法,其包括:一.前置步驟、二.計算步驟、三.一次傾斜曝光步驟、四.旋轉180°步驟、五.二次傾斜曝光步驟,以及六.完成步驟;藉此,以兩次微影成型,加上其間一次180°轉動,而可利用紫光外之折射,於光阻上成型具有45°傾斜面的脊樑式波導結構,如此兼具製程簡單且尺寸穩定、可縮短製程並降低製作成本、可大量生產,以及應用範圍廣泛等優點。
URI: http://hdl.handle.net/11455/56833
Appears in Collections:精密工程研究所

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