Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/57069
DC FieldValueLanguage
dc.contributor蔡坤財zh_TW
dc.contributor李世章zh_TW
dc.contributor.authorLIN, CHINGHSUANen_US
dc.contributor.author林慶炫zh_TW
dc.contributor.authorCHANG, SHENGLUNGen_US
dc.contributor.author張勝隆zh_TW
dc.date2010-07zh_TW
dc.date.accessioned2014-06-06T09:14:12Z-
dc.date.available2014-06-06T09:14:12Z-
dc.identifier.urihttp://hdl.handle.net/11455/57069-
dc.description.abstract一系列以鑽石烷為基質之化合物,具有如式(I)所示之結構: 其中A包含NO2、NH2;R1-R7分別選自於氫、碳數為1至6之烷基、碳數為1至6之氧烷基、碳數為3至7之環烷基、-CF3、-OCF3或鹵原子。zh_TW
dc.language.isoen_USzh_TW
dc.publisher化學工程學系zh_TW
dc.relation.urihttp://twpat.tipo.gov.tw/tipotwoc/tipotwkmen_US
dc.titleMANUFACTURE OF LOW-DIELECTRIC MATERIALS AND DERIVATIVESen_US
dc.title低介電常數材料及其衍生物之製造方法zh_TW
dc.typePatentzh_TW
item.languageiso639-1en_US-
item.openairetypePatent-
item.cerifentitytypePublications-
item.grantfulltextnone-
item.fulltextno fulltext-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
Appears in Collections:化學工程學系所
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