Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67576
標題: Effects of temperature on columnar microstructure and recrystallization of TiO2 film produced by ion-assisted deposition
作者: Chen, H.C.
薛富盛
Lee, C.C.
Jaing, C.C.
Shiao, M.H.
Lu, C.J.
Shieu, F.S.
關鍵字: titanium-oxide films;thin-films;optical-properties
Project: Applied Optics
期刊/報告no:: Applied Optics, Volume 45, Issue 9, Page(s) 1979-1984.
摘要: 
Titanium oxide thin films were deposited by electron-beam evaporation with ion-beam-assisted deposition. The effect of the substrate temperature and annealing temperature on the columnar microstructure and recrystallization of titanium oxide was studied. The values of the refractive index varied from 2.26 to 2.4, indicating that the different substrate temperatures affected the film density. X-ray diffraction revealed that all films were amorphous as deposited. At annealing temperatures from 100 degrees C to 300 degrees C, only the anatase phase was formed. As the substrate temperature increased from 150 degrees C to 200 degrees C to 250 degrees C, the recrystallization temperature fell from 300 degrees C through 250 degrees C to 200 degrees C. Changing the substrate temperature resulted in the formation of various types of columnar microstructure, as determined by scanning-electron microscopy. Different columnar structures resulted in different surface morphologies, as measured by atomic-force microscopy. (c) 2006 Optical Society of America.
URI: http://hdl.handle.net/11455/67576
ISSN: 0003-6935
DOI: 10.1364/ao.45.001979
Appears in Collections:工學院

Show full item record
 

Google ScholarTM

Check

Altmetric

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.