Please use this identifier to cite or link to this item:
|標題:||Effects of substrate temperature on the structure and mechanical properties of (TiVCrZrHf)N coatings||作者:||Liang, S.C.
|Project:||Applied Surface Science||期刊/報告no：:||Applied Surface Science, Volume 257, Issue 17, Page(s) 7709-7713.||摘要:||
The present paper reports the influence of growth conditions on the characteristics of (TiVCrZrHf)N films prepared by rf reactive magnetron sputtering at various substrate temperatures. The nitrogen content is observed to decrease with increasing substrate temperature. The X-ray diffraction results indicate that all (TiVCrZrHf)N films are simple face centered cubic (FCC) structures. Initially, there is an obvious decrease followed by an increase in grain size with the increase in substrate temperature. The lower part of the microstructure has an amorphous structure. A nano grain structure (size similar to 1 nm) with a random orientation is also observed above the amorphous structure. The fully dense columnar structure with an fcc crystal phase then starts to develop. Extreme hardness of around 48 GPa is obtained in the present alloy design. (C) 2011 Elsevier B. V. All rights reserved.
|Appears in Collections:||工學院|
Show full item record
TAIR Related Article
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.