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|標題:||Structural and mechanical properties of multi-element (TiVCrZrHf)N coatings by reactive magnetron sputtering||作者:||Liang, S.C.
|關鍵字:||Hard coatings;Multi-element nitride;Structure;Hardness;tantalum nitride films;high-entropy alloys;thin-films;al;si;growth;elements;target||Project:||Applied Surface Science||期刊/報告no：:||Applied Surface Science, Volume 258, Issue 1, Page(s) 399-403.||摘要:||
In this study, (TiVCrZrHf)N multi-component coatings with quinary metallic elements were deposited by reactive magnetron sputtering system. The composition, structure, and mechanical properties of the coatings deposited at different N(2) flow rates were investigated. The (TiVCrZrHf) N coatings deposited at N(2) flow rates of 0, 1, and 2 SCCM showed an amorphous structure, whereas those deposited at N(2) flow rates of 4 and 6 SCCM showed a simple face-centered cubic solid solution structure. A saturated nitride coating was obtained for N(2) flow of 4 SCCM and higher. By increasing N(2) flow to 4 SCCM, the hardness and modulus reached a maximum value of 23.8 +/- 0.8 and 267.3 +/- 4.0 GPa, respectively. (C) 2011 Elsevier B. V. All rights reserved.
|Appears in Collections:||工學院|
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