Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67583
標題: Structural and mechanical properties of multi-element (TiVCrZrHf)N coatings by reactive magnetron sputtering
作者: Liang, S.C.
薛富盛
Tsai, D.C.
Chang, Z.C.
Sung, H.S.
Lin, Y.C.
Yeh, Y.J.
Deng, M.J.
Shieu, F.S.
關鍵字: Hard coatings;Multi-element nitride;Structure;Hardness;tantalum nitride films;high-entropy alloys;thin-films;al;si;growth;elements;target
Project: Applied Surface Science
期刊/報告no:: Applied Surface Science, Volume 258, Issue 1, Page(s) 399-403.
摘要: 
In this study, (TiVCrZrHf)N multi-component coatings with quinary metallic elements were deposited by reactive magnetron sputtering system. The composition, structure, and mechanical properties of the coatings deposited at different N(2) flow rates were investigated. The (TiVCrZrHf) N coatings deposited at N(2) flow rates of 0, 1, and 2 SCCM showed an amorphous structure, whereas those deposited at N(2) flow rates of 4 and 6 SCCM showed a simple face-centered cubic solid solution structure. A saturated nitride coating was obtained for N(2) flow of 4 SCCM and higher. By increasing N(2) flow to 4 SCCM, the hardness and modulus reached a maximum value of 23.8 +/- 0.8 and 267.3 +/- 4.0 GPa, respectively. (C) 2011 Elsevier B. V. All rights reserved.
URI: http://hdl.handle.net/11455/67583
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2011.09.006
Appears in Collections:工學院

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