Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/67584
標題: Structure and optoelectronic properties of multi-element oxide thin film
作者: Yu, R.S.
薛富盛
Huang, C.J.
Huang, R.H.
Sun, C.H.
Shieu, F.S.
Project: Applied Surface Science
期刊/報告no:: Applied Surface Science, Volume 257, Issue 14, Page(s) 6073-6078.
摘要: 
This paper focuses on analyzing structural and optoelectronic properties of (ZnSnCuTiNb)(1-x)O(x) films. The results of XRD and HRTEM indicate that the (ZnSnCuTiNb)(1-x)O(x) films are all of amorphous without any multi-phase structure. XPS analysis confirms that the increase of the oxygen content makes the cations electron binding energy higher, suggesting the removal of valence electrons or the extent of oxidation can change the optoelectronic properties of the films. The (ZnSnCuTiNb)(1-x)O(x) films possess the characteristics of optoelectronic semiconductor whose oxygen content are 51.6 and 56 atom%. These films have carrier concentrations of 2.62x10(20) and 1.37x10(17) cm(-3), and conductivities (sigma) of 57.2 and 9.45x10(-3) (Omega cm)(-1), and indirect band gaps of 1.69 and 2.26 eV, respectively. They are n-type oxide semiconductors. Crown Copyright (C) 2011 Published by Elsevier B. V. All rights reserved.
URI: http://hdl.handle.net/11455/67584
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2011.01.139
Appears in Collections:工學院

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